EFFECT OF PHOTOOXIDATION ON PHOTOLUMINESCENCE OF N, N'-DIPHENYL-N, N'-DI(M-TOLYL)-BENZIDINE AND RUBRENE CODOPED PMMA THIN FILMS

查看全文 作　　者：YB. Hou, L.J. Meng and M.P. dos Santos ( Department of Physics, Minho University, Braga 4719, Portugal) ( Departamento de Fisica, Instituto Superior de Engenharia do Porto, Rua de Sao Tome, 4200 Porto, Portugal) 出　　处：《Acta Metallurgica Sinica(English Letters)》索引2001年第14卷第6期,共7页 摘　　要：In this paper, the PMMA films doped with N,N’-diphenyl-N,N’-di(m-tolyl)-benzidine and rubrene were fabricated by spin coating, and the effect of photooxidation on the photoluminescence of the doped PMMA thin films was investigated. The results showed that under the irradiation of 350nm UV light, N,N’-diphenyl-N,N’-di(m-tolyl)-benzidine can sensitized rubrene and results in the enhancement in the photooxidation of rubrene. The effect of photooxidation on the photoluminescence from rubrene was more obvious. Both lifetime measurement and in situ measurement of photoluminescence showed that rubrene molecules exist in two chemical surroundings. 关 键 词：photoluminescence, PHOTOOXIDATION