Optimization of heat shield for single silicon crystal growth by using numerical simulation

查看全文 作　　者：TENG Ran [1];ZHOU Qigang [1];DAI Xiaolin [2];WU Zhiqiang [2];XU Wenting [1];XIAO Qinghua [2];WU Xiao [2];GUO Xi [2]

机构地区：General Research Institute for Nonferrous Metals, Beijing 100088, China; GRINM Semiconductor Materials Co., Ltd., Beijing 100088, China[1] GRINM Semiconductor Materials Co., Ltd.,Beijing 100088, China[2]

出　　处：《Rare Metals》索引2012年第31卷第5期,共5页

基　　金：supported by the Major National Science & Technology Program of China(No.2009ZX02011) 摘　　要：In integrated circuit-grade single silicon Czochralski growth, the position and material of heat shield are main parameters affecting the heat exchange and crystal growth condition. By optimizing the above parameters, we attempted to increase the growth rate and crystal quality. Numerical simulation proved to verify the results before and after optimization. Through analyses of the temperature and microdefect distribution, it is found that the optimized heat shield can further increase the pulling rate and decrease the melt/crystal interface deflection, increase the average velocity of argon flow from ~2 to ~5 m·s^-1 , which is in favor of the transportation of SiO, and obtain the low defects concentration crystal and that the average temperature along the melt-free surface is 8 °C higher than before avoiding supercooled melt effectively. 关键词：半导体等级硅 Czochralski 方法数字模拟热盾

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Optimization of heat shield for single silicon crystal growth by using numerical simulation

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