Photolithography by a tunable electro-optical lithium niobate phase array

查看全文 作　　者：M. [1]Paturzo;C. Del [1]Core;S. [1]Grilli;S.De [1]Nicola;P. [1]Ferraro;P. De [1]Natale;G. [2]Coppola;M. [2]Iodice;M. [2]Gioffré 机构地区：[1]Istituto Nazionale di Ottica Applicata del CNR and LENS-European Laboratory for Nonlinear Spectroscopy,Via Campi Flegrei 34, 80078 Pozzuoli (Na), Italy;[2]Istituto Microelettronica e Microsistemi del CNR,Via P. Castellino 111, 80131, Napoli, Italy 出　　处：《Optoelectronics Letters》索引2007年第3卷第4期,共3页 基　　金：This research was partially funded by the MIUR within the FIRB project ( No. RBNE01KZ94 );partially by the MIUR project(No.77 DD N.1105/2002). 摘　　要：Photolithography experiments are performed by means of an optical phase mask with electrooptically tunable phase step. The phase mask consists of a 2-dimensional hexagonal lattice of inverted ferroelectric domains fabricated on a z-cut lithium niobate substrate. The electro-optically tunable phase step, between inverted domain, is obtained by the application of an external electric field along the z axis of the crystal via transparent electrodes. The collimated beam of an argon laser passes through the phase mask and the near field intensity patterns, at different planes of the Talbot length and for different values of the applied voltage, are used for photolithographic experiments. Preliminary results are shown and further applications are discussed. 关 键 词：电光学 光刻实验 铁电物质 锂铌酸盐