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269篇 您的检索式:期刊名="Journal of Vacuum Science Technology B"
    题名 作者 年代 出处 被引量
1Modified Postannealing of the Ge Condensation Process for Better-strained Si Material and Devices 显示文摘Liu X Y Ma X B Du X F 2010Journal of Vacuum Science & Technology B : Microelectronics and Nanometer Structures2010,28,5:1
2Screen Printed Carbon Nanotube Field Emitter Array for Lighting Source Application显示文摘Park JH Son GH Moon JS 2005Journal of Vacuum Science & Technology B2005,23,2:1
3Carrier Densities in InAs/Ga(Al)Sb(As) Quantum Wells显示文摘Munekata H Esaki L Chang LL 1987Journal of Vacuum Science and Technology B1987,5,3:1
4Mechanisms of copper removal during chemical mechanical polishing 显示文摘Steigerwald J M Murarka S P Gutmann R J 1995Journal of Vacuum Science and Technology B1995,13,6:1
5Electrical measurements of the conduction band discontinuity of the abrupt Ge-GaAs (100) heterojunction显示文摘Ballingall J M C Wood E C Eastman L F 1983Journal of Vacuum Science & Technology B1983,1,3:1
6Low temperature crystallization of high permittivity Ta oxide using an Nb oxide thin film for metal/insulator/metal capacitors in dynamic random access memory applications 显示文摘DONGJOON M SUNGHO P BUM-SEOK S CHOI S LEE N LEE J H 2005Journal of Vacuum Science and Technology B2005,23,1:1
7Overlay performance of 180 nm ground rule generation X- ray lithography aligner 显示文摘CHEN A C FLAMHOLZ A L RIPPSTEIN R 1997Journal of Vacuum Science and Technology B1997,15,6:1
8Imprint lithography for integrated circuit fabrication 显示文摘RESNICK D J DAUKSHER W J MANCINI D 2003Journal of Vacuum Science & Technology B2003,21,6:1
9Sub-10 nm imprint lithography and applications显示文摘Stephen Y Chou Peter R Krauss Zhang Wei 1997Journal of Vacuum Science&Technology B1997,15,6:1
10Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff显示文摘Yu Z Gao H Wu W 2003Journal of Vacuum Science&Technology B2003,21,6:1
11Improvement of Emission Characteristics Uniformity of Carbon Nanotube Field Emission Display By Surface Treatment显示文摘Shiroishi T Hosono A Sono A 2006Journal of Vacuum Science & Technology B2006,24,2:1
12Sub-10 nn imprint lithography and applications显示文摘Chou S Y Krauss P R Zhang W 1997Journal of Vacuum Science&Technology B1997,15,6:1
13Surface-science aspects of vacuum microelectronics 显示文摘Schwoebel P R Brodie I 1995Journal of Vacuum Science and Technology B1995,13,4:1
14Novel scheme for the preparation of transmission electron microscopy specimens with a focused ion beam 显示文摘OVERWIJK M VAN DEN HEUVEL F BULLE‐LIEUWMA C 1993Journal of Vacuum Science & Technology B1993,11,6:1
15Implementation of an imprint damascene process for interconnect fabrication显示文摘Gerard M Schmid Michael D Stewart Jeffrey Wetzel 2006Journal of Vacuum Science&Technology B2006,24,3:1
16Synthesis and characterization of one- dimensional WO2 nanorods 显示文摘Ma Y R Lin C hi Ye C L 2005Journal of Vacuum Science and Technology B2005,23,5:1
17Nanobubbles on solid surface imaged by atomic force microscopy显示文摘Lou S T Ouyang Z Q Zhang Y 2000Journal of Vacuum Science and Technology B : Microelectronics and Nanometer Structures2000,18,5:1
18Advanced techniques for glancing angle deposition 显示文摘K Robbie J C Sit M J Brett 1998Journal of Vacuum Science & Technology B1998,16,:1
19Nanoimprint and nanocontact technologies using hydrogen silsesquioxane显示文摘Ken-ichiro Nakamatsu Keiichiro Watanabe Katsuhiko Tone 2005Journal of Vacuum Science&Technology B2005,23,2:1
20Nanofabrication of high aspect ratio 24nm X-ray zone plates for X-ray imaging applications 显示文摘Feng Y Feser M Lyon A 2007Journal of Vacuum Science ~ Technology B2007,25,6:1
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