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20篇 您的检索式:作者名="LEE Chongmu"
    题名 作者 年代 出处 被引量
1A comparison of transmittance properties between ZnO∶Al films for transparent conductors for solar cells deposited by sputtering of AZO and cosputtering of AZO/ZnO显示文摘Aluminum-doped zinc oxide (AZO) thin films were deposited on sapphire (002) and glass substrates by two different sputtering techniques radio frequency magnetron cosputtering of AZO and ZnO targets and sputtering of an AZO target. The dependence of the photoluminescence (PL) and transmittance properties of the AZO films deposited by cosputtering and sputtering on the AZO/ZnO target power ratio, R and the O2/Ar flow ratio, r were investigated, respectively. Only a deep level emission peak appears in the PL spectra of cosputtered AZO films whereas both UV emission and deep level emission peaks are observed in the PL spectra of sputtered AZO films. The absorption edges in the transmittance spectra of the AZO films shift to the lower wavelength region as R and r increase. Effects of crystallinity, surface roughness, PL on the transmittance of the AZO films were also explained using the X-ray diffraction (XRD), atomic force microscopy (AFM), and PL analysis results.LEE Chongmu YIM Keunbin CHO Youngjoon Lee J.G. 2006Rare Metals2006,25,z1:8
2Room temperature hydrogen sensing performances of multiple networked Ga N nanowire sensors codecorated with Au and Pt nanoparticles显示文摘The sensing performances of multiple networked Ga N nanowire(NW) sensor codecorated with Au and Pt nanoparticles were examined. The pristine Ga N nanowires show responses of approximately 108%-173% to 0.05%-0.25% H2 at room temperature. On the other hand, the Ga N nanowires decorated with Au and those decorated with Pt lead to 1.1-1.3 and 1.2-1.6 times,respectively, stronger responses to 0.05%-0.25% H2. In contrast, the Au Pt-codecorated Ga N nanowires show 1.3-2.0 times stronger responses to 0.05%-0.25% H2. In other words, the Ga N nanorods codecorated with Au and Pt nanoparticles show much stronger response to H2 gas than the Au or Pt monometal-decorated counterpart. The underlying mechanism for the enhanced response of the Au Pt-codecorated Ga N nanowire was discussed.PARK Sunghoon KIM Soohyun PARK Suyoung LEE Sangmin LEE Chongmu 2015Journal of Central South University2015,22,5:2
3Growth of nitrogen-doped p-type ZnO thin films prepared by atomic layer epitaxy显示文摘Nitrogen-doped, p-type ZnO thin films were grown successfully on sapphire (0001) substrates by using atomic layer epitaxy (ALE). Zn(C2H5)2 [Diethylzinc, DEZn], H2O and NH3 were used as a zinc precursor, an oxidant and a doping source gas, respectively. The lowest electrical resistivity of the p-type ZnO films grown by ALE and annealed at 1000 ℃ in an oxygen atmosphere for 1 h was 18.3 Ω·cm with a hole concentration of 3.71×1017 cm-3. Low temperature-photoluminescence analysis and time-dependent Hall measurement results support that the nitrogen-doped ZnO after annealing is a p-type semiconductor.LEE Chongmu LIM Jongmin PARK Suyoung KIM Hyounwoo 2006Rare Metals2006,25,z1:2
4A theoretical approach for the thermal expansion behavior of the particulate reinforced aluminum matrix composite Part I A thermal expansion model for composites with mono-dispersed spherical particles显示文摘Chong-Sung Park Myung-Ho Kim Chongmu Lee 2001Journal of Materials Science2001,,14:1
5Ta-Si-N as a diffusion barrier between Cu and Si显示文摘Chongmu Lee Young-Hoon Shin 1998Mater Chem Phys1998,57,:1
6Hardness and adhesion properties of HfN/Si3 N4 and NbN/Si3 N4 multilayer coatings 显示文摘Jin Jung Jeong Sun Keun Hwang Chongmu Lee 2002Materials Chemistry and Physics2002,77,:1
7Evaluation of Ti-Si-N as a diffusion barrier between copper and silicon 显示文摘Jin-Tae No Jun-Hwan O Chongmu Lee 2000Mater Chem Phys2000,63,:1
8Enhanced ethanol sensing properties of TiO 2 nanotube sensors显示文摘Youngjae Kwon Hyunsu Kim Sangmin Lee In-Joo Chin Tae-Yeon Seong Wan In Lee Chongmu Lee 2012Sensors & Actuators: B Chemical2012,,:1
9IZO/Al/GZO multilayer films to replace ITO films显示文摘Chongmu Lee R. P. Dwivedi Wangwoo Lee Chanseok Hong Wan In Lee Hyoun Woo Kim 2008Journal of Materials Science: Materials in Electronics2008,,10:1
10Ta-Si-N as a diffusion barrier between Cu and Si显示文摘Lee Chongmu Shin Young-Hoon 1998Mater Chem Phys1998,57,:1
11Dry cleaning for metallic contaminants removal as the second cleaning process after the CMP process显示文摘Jong-Min Lim Bu-yong Jeon Chongmu Lee 2001Materials Chemistry and Physics2001,70,:1
12Growth of SnO 2 nanowires by thermal evaporation on Au-coated Si substrates显示文摘Sunghoon Park Chanseok Hong Jungwoo Kang Namhee Cho Chongmu Lee 2009Current Applied Physics2009,,3:1
13Growth of ZnO thin films by using an atomic layer epitaxy technique and NH3 as a doping source显示文摘LEE CHONGMU PARK SUYOUNG LLM JONQMIN 2007Materials letters2007,61,1112:1
14Amorphous gallium oxide nanowires synthesized by metalorganic chemical vapor deposition显示文摘Nam Ho Kim Hyoun Woo Kim Chang Seoul Chongmu Lee 2004Materials Science & Engineering B2004,,2:1
15Temperature-controlled synthesis of Zn 2 GeO 4 nanowires in a vapor–liquid–solid mode and their photoluminescence properties显示文摘Hyoun Woo Kim Han Gil Na Ju Chan Yang Chongmu Lee 2011Chemical Engineering Journal2011,,3:1
16Hardness and adhesion properties of HfN/Si3N4 and NbN/Si3N4 multilayer coatings显示文摘Jin Jung Jeong Sun Keun Hwang Chongmu Lee 2002Materials Chemistry and Physics2002,77,:1
17Structural and electrical properties of porous silicon with rf-sputtered Cu films显示文摘Ansari Z A Hong Kwangpyo Lee Chongmu 2002Materials Science and Engineering B2002,90,1:1
18Evaluation of Ti-Si-N as a diffusion barrier between copper and silicon显示文摘No Jin Tae O Jun Hwan Lee Chongmu 2000Material Chemistry and Physics2000,63,:1
19A theoretical approach for the thermal expansion behavior of the particulate reinforced aluminum matrix composite Part I A thermal expansion model for composites with mono-dispersed spherical particles显示文摘Chong-Sung Park Myung-Ho Kim Chongmu Lee 2001Journal of Materials Science2001,,14:1
20Electrical Properties of Sputter-deposited ZrO2-based Pt/ZrO_2/Si Capacitors显示文摘在 ZrO_2 被无线电扔的地方, Pt/ZrO_2/Si 三明治组织频率( r.f )磁控管在 O_2/Ar 煤气的混合的气氛用一个 Zr 目标劈啪作响,被制作, O_2/Ar 的效果流动在反应劈啪作响过程的比率,退火的温度,结构上的 ZrO_2 电影厚度, ZrO_2films 的表面粗糙和 Pt/ZrO_2/Si metal-oxide-semiconductor (瞬间)的电的性质电容器我们 reinvestigated 。 Pt/ZrO_2/Si 电容器的最佳进程参数以电容被最大化的如此的一个方法和漏泄电流基于 reactivelysputtered-ZrO_2 决定那是 1.5 的 O_2/Ar 流动比率,氧化物收费,并且接口陷井密度被最小化, 800 deg C 的退火的温度,并且 10 nm 的电影厚度。另外,在 Pt/ZrO_2/Si 电容器的传导机制被讨论了。Keunbin YIM Yeonkyu PARK Anna PARK Namhee CHO Chongmu LEE 2006Journal of Materials Science & Technology2006,22,6:0
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