| 1 | 热文点评原文摘要显示文摘中文:背景患者入院后可从不当消毒的环境表面获得多药耐药菌和艰难梭菌。本文确定了3种强化的终末消毒(入住同一病房的两名患者之间的消毒)策略,对感染耐甲氧西林金黄色葡萄球菌(MRSA)、耐万古霉素肠球菌(VRE)、艰难梭菌(CD)和多重耐药不动杆菌的影响。方法本文在美国东南部的9家医院开展了一项务实的、集群-随机、交叉研究。凡曾有感染或定植目标细菌感染患者居住过的病房,患者出院后随机采取4种消毒策略中的一种方法进行终末消毒:对照(季胺盐类消毒剂消毒,但凡遇到CD采用含氯消毒剂);UV(季胺盐类+UV-C消毒,但凡遇到CD采用含氯消毒剂+UV-C);含氯消毒剂;含氯消毒剂+UV-C。凡入住目标病房的患者被列为暴露人群。这4种终末消毒方法分别在每家医院连续实施7个月的周期。本文随机设计这几种消毒策略在每家医院内的实施顺序(1:1:1:1)。主要产出的结果是,观察暴露患者中目标细菌的感染的发生或定植情况,以及ITT人群中暴露患者CD感染发生率。本研究ClinicalTrials.gov注册编号:NCT01579370。结果共有31226名患者暴露,其中21395(69%)符合标准,包括4916名对照组,5178名UV组,5438名含氯消毒剂组,以及5863名含氯消毒剂+UV组。在对照组中,22426个暴露日中有115名患者发生目标细菌的感染(51.3/10000暴露日)。在标准清洁策略的基础上增加UV消毒的暴露患者,其目标细菌感染的发生率明显较低(n=76;33.9/10000暴露日;RR:0.70,95%CI:0.50~0.988;P=0.036)。含氯消毒剂组(n=101;41.6/10000暴露日;RR:0.85,95%CI:0.69~1.04;P=0.116),或含氯消毒剂+UV组患者(n=131;45.6/10000暴露日;RR:0.91,95%CI:0.76~1.09;P=0.303)的目标细菌的感染率,其差异无统计学意义。同样,在含氯消毒剂的基础上增加UV消毒,暴露患者中CD感染率也没有发生改变((n=38vs36;30.4vs31.6/10000暴露日;RR:1.0,95%CI:0.57-1.75;P=0.997)。解释污染的医疗机构环境是获得病原微生物的重要来源;强化终末消毒可以降低这一风险。 | Deverick J Anderson Luke F Chen David J Weber Rebekah W Moehring Sarah S Lewis Patricia F Triplett Michael Blocker Paul Becherer J Conrad Schwab Lauren P Knelson Yuliya Lokhnygina William A Rutalo Hajimori Kanamori Marina F Gergen Daniel J Sexton | 2018 | 中华医院感染学杂志2018，28，12： | 1 |
| 2 | Bridging the Divide Between Iterative Optical Polishing and Automation显示文摘Several recent business reports have described the global growth in demand for optical and photonic components,paralleled by technical reports on the growing shortage of skilled manufacturing staff to meet this demand.It is remarkable that producing ultraprecision surfaces remains so dependent on people,in contrast to other sectors of the economy,e.g.,car manufacturing.Clearly,training can play some role,but ultimately,only process automation can provide the solution.This paper explores why automation is a challenge and summarizes multidisciplinary work aiming to assemble the building blocks required to realize automation. | David Walker Juan I.Ahuir‑Torres Yasemin Akar Paul A.Bingham Xun Chen Michal Darowski Oliver Fähnle Philippe Gambron Frankie F.Jackson Hongyu Li Luke Mason Rakesh Mishra Abdullah Shahjalal Guoyu Yu | 2023 | Nanomanufacturing and Metrology2023，6，3： | 0 |
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