维普期刊资源整合服务平台（V6.5）

43篇 您的检索式：作者名="YEOM G Y"

选中清除导出查看参考文献查看引证文献引用追踪共3页首页上一页第1页下一页末页 /3 跳转

	题名	作者	年代	出处	被引量
1	Inductively coupled plasma etching of InP in Cl2/Ar plasmas显示文摘	KIM H S YEOM G Y LEE J W	1999	Thin Solid Films1999，341，2：	1
2	Study of shallow silicon trench etch process using planar inductively coupled plasmas显示文摘	LEE J H YEOM G Y LEE J W	1997	J Vacuum Sci Technol A1997，15，3：	1
3	Development of korean high altitude platform systems显示文摘	Lee Y G Kim D M Yeom C H	2006	International Journal of Wireless Information Networks2006，13，1：	1
4	Poly( DMAEMA-NVP)-b- PEG-galactose as gene delivery vector for hepatocytes 显示文摘	LIM D W Yeom Y I PARK T G	2000	Bioconjugate Chem2000，11，5：	1
5	Development of Korean high alti- tude platform systems 显示文摘	LEE Y G KIM D M YEOM C H	2006	International Journal of Wireless Informa- tion Networks2006，13，1：	1
6	Anti-inflammatory effect of platelet- rich plasma on nucleus pulposus cells with response of TNF-alpha and IL-1 显示文摘	KIM H J YEOM J S KOH Y G	2014	J Orthop Res2014，32，4：	1
7	Development of Korean high alti- tude plaffoml systems显示文摘	Y G Lee D M Kim C H Yeom	2006	Wireless hfformation Networks2006，13，1：	1
8	Anti-inflammatory effect of platelet- rich plasma on nucleus pulposus cells with response of TNF- alpha and 1L- 1 显示文摘	KIM H J YEOM J S KOH Y G	2014	J Orthop Res2014，32，55：	1
9	Plasma and Antenna Charac- teristics of a Linearly Extended Inductively Coupled Plasma System Using Multi-Polar Magnetic Field 显示文摘	Kim K N IZn J H Yeom G Y	2007	Thin Solid Films2007，515，：	1
10	Magnetized inductively coupled plasma etching of GaN in Cl2/BCl3 plasmas显示文摘	LEE Y H SUNG Y J YEOM G Y	2000	J Vac Sci Technol A2000，18，4：	1
11	Germline regulatory element of Oct4 specific for the totipotent cycle of embryonal cells显示文摘	Yeom Y I Fuhrmann G Ovitt C E	1996	Development1996，122，：	1
12	Si/SiOz etch properties using CF4 and CHF3 in radio frequency cylindrical magnetron discharges显示文摘	Yeom G Y Kushner M J	1990	Appl Phys Lett1990，6，9：	1
13	Fabrication of trench nanostructures for extreme ultraviolet lithography masks by atomic force microscope lithography显示文摘	KWON G KO K LEE H LIM W YEOM G Y LEE S and AHN J		0，，：	1
14	A study of GaN etch mechanisms using inductively coupled Cl2/Ar plasma 显示文摘	Kim H S Yeom G Y Lee J W	1999	Thin Solid Films1999，341，2：	1
15	Electrical,optical and structural characteristics of ITO thin films by krypton and oxygen dual ion-beam assisted evaporation at room temperature显示文摘	BAE J W KIM J S KIM K S JANG Y C YEOM G Y LEE N E	2000	Thin Solid Films2000，37，7378：	1
16	Properties and applications of a modified dielec- tric barrier discharge generated at atmospheric pressure显示文摘	Lee Y H Yeom G Y	2005	Japanese Journal of Applied Physics2005，44，2：	1
17	Effects ofinductively coupled plasma conditions on the etch propertiesof GaN and ohmic contact formations显示文摘	KIM H S LEE Y H YEOM G Y	1997	MaterialsScience and Engineering1997，50，123：	1
18	Characteristics of inductively coupled Cl2/BCl3plasmas during GaN etching显示文摘	Kim H S Yeom G Y Lee J W	1999	Journal of Vacuum Science&Technology a-Vacuum Surfaces and Films1999，17，4：	1
19	Development of Korean high altitude platform systems显示文摘	Lee Y G Kim D M Yeom C H	2006	Int J Wireless Information Networks2006，13，1：	1
20	Magnetized inductively coupled plasma etching of GaNin Cl2/BCl3 plasmas显示文摘	LEE Y H SUNG Y J YEOM G Y	2000	J Vac Sci Technol:A2000，18，4：	1

返回顶部每页显示：

共3页首页上一页第1页下一页末页 /3 跳转

互联网出版许可证新出网证(渝)字10号全国400电话 - 免长途话费

用户提示